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 Printer-friendly format 3M™ Specialty Gases
Specialty gases are used in removing material buildup from chemical vapor deposition (CVD) reactor chambers in semiconductor manufacturing. Offers reduced emission, lower gas usage rates and faster chamber cleaning.

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3M™ Specialty Gas PFG-3218
PFG-3218 gas (C3F8) lowers gas useage and PFC emissions in CVD chamber cleaning while maintaining a level of cleaning performance comparable to C2F6.

3M™ Specialty Gas PFG-3480
PFG-3480 gas (C4F8O) dramatically lowers PFC emissions in CVD chamber cleaning, offering both economic and environmental advantages.


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