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Product Catalog for 3M™ Superbrasives and Microabrasives Solutions Abrasive Semiconductor Applications

Semiconductor CMP - Pad Conditioning
3M™ Diamond Pad Conditioning Products [click to enlarge]
Improve the consistency of your semiconductor CMP process. Long lasting 3M™ Diamond Pad Conditioners properly prepare the surface of the CMP pad, lengthening the life of the pad and enabling more consistent wafer removal rates.

Additional Information

Learn More . . .

  3M™ Diamond Pad Conditioners for CMP, flyer - Flyer (PDF 416.6 K)
  Measurement and Analysis of Diamond Retention PDF - Technical Paper (PDF 399.4 K)
  New Pad Conditioning Disk Design Delivers PDF - Article Reprint (PDF 89.4 K)

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3M™ Diamond Pad Conditioning Disks
New 3M technology allows for the controlled placement and spacing of diamond in a metal bond matrix. Premium graded diamond is combined with a tightly controlled mfg. process to produce consistent single layer diamond disks for CMP pad conditioning.

3M™ Diamond Pad Conditioning Rings
New 3M technology allows for the controlled placement and spacing of diamond in a metal bond matrix. Premium graded diamond is combined with a tightly controlled mfg. process to produce consistent single layer diamond rings for CMP pad conditioning.


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